Home

About Oliff & Berridge

History & Philosophy

Securing Intellectual Property

Practice Summary

Evaluating Intellectual Property

Litigating Intellectual Property

Services & Communications

Continuing Legal Education

Supporting our Community

Attorneys

Alphabetical Listing

Members

Of Counsel

Associates

Patent Agents

Law Clerks

Technical Specialists

News & Events

Intellectual Property Links

Patent Information

Trademark Information

Copyright Information

General Information Links

Contact Us

Location, Address, Email

Map/Directions from Area Airports

Hotel Information

Alexandria Attractions

Careers

Positions Available

Benefits

 

 

Robert Y. Hsiao

Oliff & Berridge, PLC

277 South Washington Street

Suite 500

Alexandria, Virginia 22314

Telephone: (703) 836-6400

Facsimile:  (703) 836-2787

Email: rhsiao@oliff.com

Position:
Associate
Admitted:
Virginia, 2010
U.S. Patent and Trademark Office, 2010
Education:
Washington University School of Law, 2010
J.D., Juris Doctor
 
University of Illinois, Champaign-Urbana, IL, 2003
B.S., Bachelor of Science in Computer Engineering
Published:
"An Improved Alignment Layer Grown by Oblique Evaporation for Liquid Crystal Devices", Liou, chen, Ho, Hsu, Chang, Hsiao, S-H Chang
 
"Performance Evaluation of the Metal Induced Lateral Crystallization (MILC) Poly-Sil-xGex thin films for Optoelectronic Applications", Chen Hsiao, Ho

Home | About Oliff & Berridge | Attorneys | News & Events | Intellectual Property Links | Contact UsCareersPositions Available  

    


© 2012 Oliff & Berridge, PLC. All rights reserved.